The PlasmaGeneratorType provides all relevant Variables and parameters for monitoring a plasma generator of a plasma surface treatment machine. An overview of the information model is shown in Figure 12.

image017.png

Figure 12 - PlasmaGeneratorType overview

The PlasmaGeneratorType is formally defined in Table 32.

Table 32 – PlasmaGeneratorType Definition

Attribute

Value

BrowseName

PlasmaGeneratorType

IsAbstract

False

References

Node Class

BrowseName

DataType

TypeDefinition

Other

Subtype of the BaseObjectType defined in OPC 10000-5

0:HasAddIn

Object

2:Identification

4:MachineryComponentIdentificationType

O

0:HasComponent

Object

4:Monitoring

4:MonitoringType

M

0:HasComponent

Object

4:MachineryBuildingBlocks

0:FolderType

M

Conformance Units

PST PlasmaGeneratorType Basic

PST PlasmaGeneratorType Advanced

Identification is used as defined in OPC 40001-1 and shall also be referenced as AddIn in the MachineryBuildingBlocks Folder.

Monitoring is representing a collection of the variables that are assigned to this specific component.

MachineryBuildingBlocks is representing a folder that directly references all those building blocks of the OPC UA for Machinery (OPC 40001-1, OPC 40001-3) which are implemented as an add-in in this specific component.

The components of the PlasmaGeneratorType have additional references which are defined in Table 33.

Table 33 – PlasmaGeneratorType Additional References

SourceBrowsePath

Reference Type

Is Forward

TargetBrowsePath

4:MachineryBuildingBlocks

0:HasAddIn

True

2:Identification

4:MachineryBuildingBlocks

0:HasAddIn

True

4:Monitoring

The components of the PlasmaGeneratorType have additional subcomponents which are defined in Table 34.

Table 34 – PlasmaGeneratorType Additional Subcomponents

Source Path

Reference

NodeClass

BrowseName

DataType

TypeDefinition

Others

4:Monitoring

4:Process

0:HasComponent

Variable

EvaporatorCurrent

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

EvaporatorVoltage

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

EvaporatorPower

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

BiasCurrent

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

BiasVoltage

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

BiasPower

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Status

0:HasProperty

Variable

BiasGeneratorSwitchOn

0:Boolean

0:PropertyType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

BiasArcCounter

UInt32

0:AnalogUnitType

O, RO

4:Monitoring

4:Status

0:HasProperty

Variable

EvaporatorGeneratorSwitchOn

0:Boolean

0:PropertyType

O, RO

4:Monitoring

4:Status

0:HasProperty

Variable

PlasmaReadyToStart

0:Boolean

0:PropertyType

O, RO

4:Monitoring

4:Status

0:HasProperty

Variable

PlasmaActive

0:Boolean

0:PropertyType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

BiasPulseFrequency

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

BiasPulseFrequency

0:HasComponent

Variable

BiasDutyCycle

UInt16

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

BiasPulseFrequency

0:HasProperty

Variable

BiasPolarity

0:String

0:PropertyType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

EvaporatorPulseFrequency

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

EvaporatorPulseFrequency

0:HasComponent

Variable

EvaporatorDutyCycle

UInt16

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

EvaporatorPulseFrequency

0:HasProperty

Variable

EvaporatorPolarity

0:String

0:PropertyType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

BiasReversePower

0:Double

0:AnalogUnitType

O, RO

4:Monitoring

4:Process

0:HasComponent

Variable

EvaporatorReversePower

0:Double

0:AnalogUnitType

O, RO

EvaporatorCurrent is representing the present current of the evaporator.

EvaporatorVoltage is representing the present voltage of the evaporator.

EvaporatorPower is representing the present power of the evaporator.

BiasCurrent is representing the present current of the bias.

BiasVoltage is representing the present voltage of the bias.

BiasPower is representing the present power of the bias.

BiasGeneratorSwitchOn is indicating the power on status of the bias generator. True means the generator is switched on.

BiasArcCounter is counting the amount of arc events during the process.

EvaporatorGeneratorSwitchOn is indicating the power on status of the evaporator generator. True means the generator is switched on.

PlasmaReadyToStart is indicating if the plasma can be switched on. True means the plasma can be switched on.

PlasmaActive is indicating if the plasma is working.

BiasPulseFrequency is representing the output frequency of the bias generator.

BiasDutyCycle is a descriptive property of BiasPulseFrequency. It is representing the pulse ontime in percent.

BiasPolarity is a descriptive property of BiasPulseFrequency. It is indicating what polarity the BiasPulseFrequence has.

EvaporatorPulseFrequency is representing the output frequency of the evaporator generator.

EvaporatorDutyCycle is a descriptive property of EvaporatorPulseFrequency. It is representing the pulse ontime in percent.

EvaporatorPolarity is a descriptive property of EvaporatorPulseFrequency. It is indicating what polarity the EvaporatorPulseFrequence has.

BiasReversePower is representing the power which flows back into the generator. It is also known by the name “reflected power”.

EvaporatorReversePower is representing the power which flows back into the generator. It is also known by the name “reflected power”.